On July 11, Dr. Jonghan Jin (CTO, Chief R&D Officer) delivered a technical seminar of approximately one hour at the National Metrology Institute of Japan (NMIJ) on the topic “Thickness and shape measurement in advanced processes using the principle of spectroscopic interferometry.” Many researchers from NMIJ’s Length Standards Group and Nano-Shape Measurement Group attended and showed strong interest.
In the presentation, he introduced the principle of spectroscopic interferometry, the design and fabrication process of spectrometers, and various research activities and real-world industrial applications currently being pursued by Meterlab. He shared a range of technical approaches and application results for advanced processes, including thickness and distance measurements using high-speed spectrometers and thickness profiling and three-dimensional shape measurement based on hyperspectrometers. He also presented a new research case aimed at applying Meterlab’s measurement technology to the operation of large telescopes at a U.S. observatory.
An active Q&A session followed the seminar. In-depth discussions covered a variety of topics, from basic terminology questions to spectrometer calibration methods, measurement-system uncertainty evaluation, and the feasibility of addressing NMIJ’s measurement needs. The event provided a meaningful opportunity to share research experience and technical perspectives. We look forward to continued exchange with measurement scientists both domestically and internationally.
