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Participation in FILMTECH 2024 Exhibition

관리자 2024-11-21 Number of views 840

From Tuesday, October 29 to Thursday, October 31, Novitec, the parent company of Meter-Lab, participated as an exhibitor in the FILMTECH section of the Highly-functional Material Week held at Makuhari Messe, Tokyo, Japan. As shown in Figure 1, Novitec’s booth (25-12) displayed prototypes developed by Meter-Lab, and Meter-Lab’s R&D team also attended.


텍스트, 건물, 실내, 숍이(가) 표시된 사진AI 생성 콘텐츠는 정확하지 않을 수 있습니다.


가구, 실내, 텍스트, 테이블이(가) 표시된 사진AI 생성 콘텐츠는 정확하지 않을 수 있습니다.

Figure 1. Novitec exhibition booth


As shown in Figure 2, promotional panels introducing four product families related to spectrometers and thickness/shape measurement devices were displayed at the front. Overall, the panels introduced the high-speed spectrometers (s-Nova), hyperspectral imaging spectrometers (s-Nova-H), thickness/refractive-index measurement sensors developed using our in-house spectrometers (t-Nova), three-dimensional surface shape measurement sensors (t-Nova-H), and precision inspection application areas that use these product families.


텍스트, 스크린샷, 디자인이(가) 표시된 사진AI 생성 콘텐츠는 정확하지 않을 수 있습니다. 

Figure 2. Promotional panels for exhibited product families


On the demo table, we installed prototypes of the three-dimensional surface shape measurement sensor (t-Nova-850H) and the thickness/refractive-index measurement sensor (t-Nova-1550TN), and demonstrated their operation (Figure 3). In the s-Nova-850H demo, we showed real-time measurement of the thickness distribution of film samples with position-dependent thickness. In the t-Nova-1550TN demo, booth visitors could insert samples with different refractive indices and thicknesses into the sensor and immediately view the thickness and refractive-index analysis results.



Figure 3. s-Nova-850H (left) and t-Nova-1550TN (right) demo setups


Our advanced optical measurement equipment attracted significant interest from visitors. In particular, the s-Nova-850 hyperspectral imaging spectrometer, which can precisely measure thickness distributions of thin films up to tens of micrometers in real time on a moving substrate, received notable attention for its applicability to in-process measurements. Its high-speed data acquisition and processing capabilities demonstrated performance that meets industrial requirements. Moreover, the t-Nova series—developed on the core high-speed/high-resolution spectrometer technology—offers a breakthrough sensor capable of simultaneously measuring thickness and refractive index, drawing substantial interest from experts in display and thin-film

industries that require precise thickness and shape metrology.


Figure 4. Booth visitor interactions and technical consultations

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